Hakuto’s Ion Beam Milling (Etching) System

Introducing Hakuto’s Ion Beam Milling (Etching) System which is an optimal etching technology for Magnetic materials, Gold, Platinum, Alloyed metals, and Compound semiconductor materials.

Features:

• Capable to etch any materials, including hard to etch materials(Magnetic and some dielectric materials, Metals).
• Etching gas is Ar only. (Toxic Gas free).
• Provides excellent etching uniformity.
• Flexibility for the etching condition.
• No need to change the recipe for each layer of multilayer stacks as seen in Spintronics. (only one recipe is enough)
• Excellent cooling system for substrate.
• No grease is required to fix the substrate.
• Several different sizes of substrate available.
• Easy to customize  based on customer’s needs and budget.
• End point detector (Optional)*

Few examples of target application:

• Thin film magnetic head
• RF devices / SAW Device
• Spintronics
• Optical component
• MR Sensor
• Super conductivity
• MEMs

Evaluation services to Etch customer’s samples can be provided upon request.